SPIE Advanced Lithography 2010

Registration: Open: November 2009 / Close: 29 February 2010

Submission Date: Abstract: August 2009 / MSS: January 2010

Web URL: http://spie.org/advanced-lithography.xml?WT.mc_id=Cal-AL

Exhibition: Advanced Lithography 2010

Dates: 22 – 25 February 2010

Synopsis / Description:

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

SPIE Advanced Lithography draws attendees and exhibitors that include the most talented researchers and the top companies working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

+ Optical Microlithography

+ EUV Lithography

+ Advances in Resist Materials and Processing Technology

+ Metrology, Inspection, and Process Control for Microlithography

+ Alternative Lithographic Technologies

+ Design for Manufacturability through Design-process Integration