This 2-day matchmaking event, parallel to EOSAM topical meetings and industrial exhibition, is a quick and easy way to meet potential cooperation partners.
People meet and greet at high speed.
20 minutes is usually enough to build connections, then the bell rings and the next talk starts.
General Chair: Paul Urbach - Delft University of Technology (NL) General co-chair: Seppo Honkanen - University of Eastern Finland (FI) Local Scientific Chair: Rainer Schuhmann – Berliner Glas KGaA (DE)
Contributions are accepted for oral and poster presentation. All authors are requested to register separately from abstract submission.
Abstracts must be submitted as two-page pdf files that are formatted along the guidelines given in this file.
You might wish to use either the Word or LaTeX template.
Abstract submission closed.
Information for authors
Time slots: Presenting authors are allotted 15 minutes (12 minutes presentation plus 3 minutes for discussion). Please plan your presentation accordingly to meet the 15 minute maximum.
Presentation upload: Speakers are requested to upload their presentation to the computer in the meeting room well in advance to their talk.
Presentation format: Please bring your presentation on a USB mass storage, CD-ROM or DVD and include all video files. File formats: ppt, pptx and pdf. A Windows-based presentation computer will be provided.
For Mac users: To make sure your presentation is displayed correctly, please:
bring your presentation as a pdf-file with fonts embedded or
restrict yourself to Arial/Times New Roman (not Times)/Courier New (not Courier)/Symbol/Wingdings when creating your ppt- or pptx-file.
Technical equipment: Technical equipment (presentation computer, video projector) will be available on-site.
There will be one poster session during EOSAM 2014.
Poster session: Wednesday, 17 September 12:45 – 14:45 CEST
Posters may be set up starting 11:15 on Wednesday, 17 September and should be completely set up no later than 12:45 that day.
Poster authors are requested to be present at their posters during the official poster session. Please prepare and print your poster in advance to the conference. Poster set-up and removal is in the responsibility of the authors.
Any posters left on the boards at the close of the poster session will be discarded. Poster numbers will be displayed on the poster boards to show authors where to place their poster.
Required poster size: The posters should have a size of DIN A1 (594 x 841 mm) or DIN A0 (841 x 1189 mm) in a portrait for-mat (no landscape format). Pins will be provided by the organiser.
Members of the Optical Society of Japan and the Chinese Optical Society are entitled to register with EOS-member fee.
Non-EU participants, EU companies and businesses (except Finland) with VAT number*
Private persons from EU, companies and businesses in Finland with VAT number (incl. VAT 24%)**
Early-bird student members
Early-bird student non-members
Late student members
Late student non-members
*EU companies and businesses with VAT number (except Finland): reverse charge for VAT payment applied according to the Finnish VAT act §65 and EU VAT directive articles 44 and 196.
** VAT 24% according to the Finnish VAT act §69H.
Early-bird deadline: Monday 18 August 2014
EOSAM 2014 will be held in Berlin Adlershof, the city of science, technology and media. See map.
Presenters at an EOS Topical Meeting are kindly invited to consider the submission of a manuscript about their research to the EOS open-access on-line journal JEOS:RP (Journal of the European Optical Society, Rapid Publications, www.jeos.org). A 20% discount will be applied to the author fee. JEOS:RP publishes articles about recent scientific research and technological innovation as well as review papers about a topic in science or innovation from the recent past. A contribution should be original and will be subjected to the journal’s standard anonymous peer review process for scientific quality. The average time-to-publication of the journal is of the order of 75 days.
This conference is operated by European Optical Society Oy, Business ID 2559965-4, VAT no: FI25599654, Domicile Joensuu, Finland.
The focus of this topical meeting is to explore new trends and applications in the field of Biophotonics and Medical Optics. New developments in optical control of cells, biomarkers, fluidics and lab on a chip devices as well as new approaches to tissue imaging and cell functionality will be discussed.
Topical meetings in Diffractive Optics in this series have been organized on eight occasions before, in most cases under the auspices of EOS (Savonlinna 1997, Jena 1999, Budapest 2001, Oxford 2003, Warsaw 2005, Barcelona 2007, Koli 2010, Delft 2012). This time, Diffractive Optics has been added as one new TOM in the 2014 EOSAM.
Contributions are solicited on all areas of Diffractive Optics and all application fields are concerned, including life sciences, sensing, solid state lighting, and solar photonics.
Topics include but are not limited to:
Modelling of diffractive optics
Diffractive optics and polarization
Scattering by diffractive optical elements
Inverse problems in diffraction optics
Fabrication and characterisation, measurement and inspection
Adaptive and switchable diffractive optics
New materials for diffractive optics including metamaterials
Pierre Chavel, Institut d’Optique (FR)
Jari Turunen, University of Eastern Finland (FI)
Benfeng Bai, Tsinghua University (CN)
Pedro Andrés Bou, Universtitat de València (ES)
Uwe Zeitner, Fraunhofer Institute for Applied Optics and Precision Engineering (DE)
Yves Jourlin, Université Jean Monnet/ CNRS (FR)
Webster Cash, University of Colorado (US): Advanced Astronomical Observatories Using Binary Diffractive Optics
Andrew Forbes, Council for Scientific and Industrial Research (ZA): Customised laser modes by dynamic and geometric phase control
Gladys Minguez-Vega, Universitat Jaume I (ES): Shaping femtosecond beams with spatial light modulators
Jaime Gómez Rivas, Eindhoven University of Technology (NL) (Joint invited talk with TOM 5)
Juan Liu, Beijing Institute of Technology (CN): Design and fabrication of the diffractive optical elements on curved surface by interference
Piotr Wróbel, University of Warsaw (PL): Diffraction grating-coupled plasmon-polariton surface waves
Toyohiko Yatagai, Utsunomiya University (JP): Full view-angle 3D display with computer-generated holograms based on rigorous diffraction theory
The registration will open at 8am on Monday morning at HZB Bessy Lobby (Albert-Einstein-Strasse 15), next to the lecture hall.
EOSAM 2014 will include for the first time a Summer School on "Novelties in OPTICS and PHOTONICS".
The Summer school will be held on Monday 15th September and is kindly hosted by PTB. The Summer School will include 10 tutorials on topics related to the main sessions (also called TOMs) of EOSAM 2014. The objective is to teach the backgrounds followed by main current applications related to the upcoming TOMs.
Design, simulation and fabrication for Si-photonics
High speed, low power PICs
Monolithic or hybrid (CMOS-compatible) optical sources and detectors (SiGe, III/V, alt. Mat. etc.)
Monolithic or hybrid fabrication for photonic structures on Si (3D-Laser-litho¬grahy and nano-imprint, etc.)
Nano photonics tailored for Si-Photonics (Photonic Crystals, nonlinear optics, etc.)
Assembly and packaging
Future Si-photonic manufacturing (e.g. foundry concepts or alternative approaches)
Chair: Ralf Bergmann, Bremer Institut für angewandte Strahltechnik (BIAS) (DE)
Co-Chair: Graham Reed, University of Southampton (GB)
Antti Säynätjoki, Aalto University (FI)
Concita Sibilia, University of Rome (IT)
Franz Hutter, Institut für Mikroelektronik Stuttgart (IMS CHIPS), Stuttgart (DE)
Gunter Roelkens, Ghent University (BE)
José Capmany, ITEAM Research Institute Universidad Politecnica de Valencia (ES)
Klaus Petermann, Technical University, Berlin (DE)
Mike Wale, Oclaro Technology Plc. (UK)
Roberta Ramponi, Politecnico di Milano (IT)
Seppo Honkanen, University of Eastern Finland (FI)
Stefan Maier, Imperial College London (GB)
Walter Lang, IMSAS, University Bremen (DE)
Bert Offrein, IBM Research, Rüschlikon (CH): Photonics for computing applications and the need for electro-optical integration
Dries van Thourhout, University of Ghent (BE): III-V integration on silicon: monolithic or bonding?
Ivo Rendina, Institute of Microelectronics and Microsystems of CNR-Italy, Napoli (IT): New perspectives in silicon micro and nanophotonics
Lars Zimmermann, Leibniz-Institut für innovative Mikroelektronik (IHP), Frankfurt Oder (DE): High-speed photonic electronic integration on silicon for telecom and metro networks
Lionel Kimerling, Massachusetts Institute of Technology (MIT), Cambridge (US): The future of Silicon Photonics
Martijn Heck, Aarhus University (DK): Integration of Ultra-Low Loss Waveguides with Silicon Photonics
Pol Van Dorpe, IMEC Leuven (BE): CMOS compatible biophotonics based on SiN waveguides
ePIXfab workshop: Fabrication and packaging services in silicon photonics
14:40 EPIC and ePIXfab: How the European industry can exploit silicon photonics?
• Carlos Lee, EPIC
14:55 Past, present and future of ePIXfab
• Pieter Dumon, IMEC
15:10 Active & passive waveguide circuits on 220 nm SOI from IMEC and Leti
• Pieter Dumon, IMEC
15:25 Silicon photonics developed on a SiGe:C BiCMOS pilot line
• Lars Zimmermann, IHP
15:40 Micron-scale SOI platform for low-loss circuits and broadband I/O coupling
• Timo Aalto, VTT
15:55 Packaging of silicon photonic chips
• Timo Aalto, VTT