Events Archive

TOM 11 – Special session for partners in an EU project to disseminating their results

Location: 
Berlin Adlershof, Germany
Part of: 
EOSAM 2014
Duration: 
15 September 2014 - 19 September 2014
Submission Timeframe: 
28 February 2014 - 4 April 2014

TOPICS

Any topic of optics and photonics is acceptable in principle. Projects that have led to a prototype product are in particular encouraged to apply.  Applications by submitting a two page abstract via the website www.conftool.com/eosam2014 indicating that the submission is for TOM 11. 

Please describe in the abstract the title and the aim of the project, the relevant EU call and the main results of the project. Furthermore, please list the proposed oral presentations (typically 3-4) and the presenters. Also briefly describe the contents of these presentations in the abstract. 

CHAIRS

  • Paul Urbach, Delft University of technology (NL)
  • Seppo Honkanen, University of Eastern Finland (FI)

 

TOM 3 – Optical System Design and Tolerancing

Location: 
Berlin Adlershof, Germany
Part of: 
EOSAM 2014
Duration: 
15 September 2014 - 19 September 2014
Submission Timeframe: 
28 February 2014 - 4 April 2014

Future trends in Optical Design with regard to Technology and Application

TOPICS

Topics include but are not limited to:

  • Optical & optomechanical system design
  • Tolerances
  • Error budgeting
  • Technological and manufacturing aspects
  • Alignment strategies
  • Digital correction means
  • Cost considerations
  • Standardization
  • Including both imaging and non-imaging optics (with applications in lighting)

CHAIRS

  • Chair: Wilhelm Ulrich, Carl Zeiss AG (DE)
  • Co-chair: Kimio Tatsuno, Koga Research Institute Inc., Tokyo (JP)

PROGRAMME COMMITTEE

  • Andrew Wood, Qioptiq (UK)
  • Irina Livshits, NRU-ITMO, University of St. Petersburg (RU)
  • Julius Muschaweck, ARRI (DE)
  • Jyrki Kimmel, Nokia (FI)
  • Kimio Tatsuno, Koga Research Institute Inc., Tokyo (JP)
  • Rob Bates, Five Focal LLC (US)
  • Ruben Mohedano, LPI (ES)
  • Rung-Ywan Tsai, Industrial Technology Research Institute, Hsinchu (TW)
  • Stefan Bäumer, TNO (NL)
  • Wilbert Ijzermann, Philips Lighting (NL)
  • Wilhelm Ulrich, Carl Zeiss AG (DE)
  • Wolfgang Vollrath, KLA-Tencor (DE)
  • Yasuhiro Ohmura, Nikon (JP)
  • Yongtian Wang, Beijing Institute of Technology (CN)

PLENARY SPEAKER

  • David Shafer, Shaferlens (US): The Evolution of a New High NA Broad Spectrum Catadioptric Design

INVITED SPEAKERS

  • Alexander Epple, Carl Zeiss SMT AG (DE): Optics design with free form surfaces
  • Alois Herkommer, Universität Stuttgart (DE): The Larange Invariant- a bridge between imaging and illumination design
  • Andy Harvey, University of Glasgow (GB): Broadening the design focus with computational imaging
  • Anurag Gupta, Google (US)
  • Chir Weei Chang, Industrial Technology Research Institute, Hsinchu (TW): Optical design and tolerancing of plenoptical camera
  • David Aikens, Savvy Optics (US): Overview about standardization in optics 
  • Dewen Cheng & Yongtian Wang, Beijing Institute of Technology (CN): Optical design and evaluation of large-magnification and high-definition rigid endoscope
  • Jan ten Thije Boonkkamp, Technical University of Eindhoven (NL): Monge-Ampere equation in illumination optics
  • Jannick Rolland, University of Rochester (US): Design of a Manufacturable Freeform Three-Mirror Imaging Telescope
  • John Rogers, Synopsys (US) 
  • Keishi Kubo, Panasonic Corp. (JP): Metrology for Asphere and Freeform optics by UA3P
  • Kevin Thompson, Synopsys (US)
  • Koichi Takahashi,  Olympus Corp. Tokyo (JP): Optical Design for the wearable head mount display
  • Massimiliano Pindo, TPI, Dresden (DE): Photomask challenges of EUV technology
  • Oliver Dross, Philips Lighting (NL): Köhler integration in color mixing collimators
  • Peter Brick, Osram (DE): Progress in High-luminance LEDs to benefit Etendue-critical Systems
  • Stephan Berlitz, Audi AG (DE): Optics for car lighting application
  • Takashi Inoue, Hamamatsu Photonics K.K. (JP): Wavefront control technology using spatial light modulator in bio and medical imaging
  • Thomas Nobis, Carl Zeiss AG (DE): A surface-resolved approach for analysis and correction of secondary color 
  • Toyohiko Yatagai, Utsunomiya University of Tokyo (JP): Optical mass storage based on polarization holography
  • Willem Vos, University of Twente (NL): Scattering of light in LED’s
  • Wolfgang Vollrath, KLA-Tencor (DE): Optical Design and Manufacturing Requirements for High- Performance Microscope Objectives
  • Zenta Ushiyama, Tyco Corp. (JP): Optical design for illumination systems

 

4th EOS Topical Meeting on Terahertz Science & Technology (TST 2014)

Location: 
Hotel Cenobio dei Dogi, Camogli, Italy
Duration: 
11 May 2014 - 14 May 2014
Submission Timeframe: 
16 December 2013 - 9 March 2014

Invited Speakers 

  • Hartmut Roskos, Goethe University Frankfurt (DE) – Keynote

 

  • Fritz Keilmann, Ludwig-Maximilians-Universität München (DE) – Masterclass
  • Jun Kono, Rice University (USA) – Masterclass
  • Christoph Deutsch, Technical University Wien / Austria
  • Mona Jarrahi, University of Michigan / USA
  • ​​Michael Johnston, University of Oxford / UK
  • Tobias Kampfrath, Fritz Haber Institute / Germany
  • Toshihiko Kiwa, Okayama University / Japan    
  • Alexey Kuzmenko, Geneva University / Switzerland    
  • Jean-François Lampin, IEMN Lille / France            
  • Joo-Hiuk Son, University of Seoul / Korea
  • Vincenzo Spagnolo, Politecnico di Bari / Italy
  • Frederic Teppe, Université Montpellier 2 / France

1st EOS Topical Meeting on Frontiers in Optical Imaging (FOI 2013)

Location: 
Centre Loewenberg, Murten, Switzerland
Duration: 
16 September 2013 - 18 September 2013

Optical imaging methods play a key role in many fields of science, engineering and in a huge number of everyday applications. FOI 2013 focuses on the most relevant and most challenging of these techniques, with the purpose of advancing the state-of-the-art in domains where the fundamental limits of imaging performance have not yet been achieved.

Final programme: download PDF programme (978 KB)
Registration form: download PDF form (125 KB)

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EOS Topical Meetings at Capri 2013

Location: 
Capri, Italy
Duration: 
12 September 2013 - 14 September 2013

 

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Session IV. Precise Optics Fabrication (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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Session I. High-Volume Manufacturing of Optical Components (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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Session V. Testing for Fabrication and Assembly (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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Session II. Latest Advances in Freeform Optics (EOSMOC 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Synopsis

Advancements in technology and innovative manufacturing processes are crucial for optical sector growth in today's global markets. Markets with high developmental momentum include the energy and semiconductor, life sciences, health care and the agri-food industries. Optical technologies play a crucial role in these markets, the importance of sophisticated but economically priced optical components being vital to new products and applications.

The 3rd EOS Conference on Manufacturing of Optical Components, EOSMOC 2013, will highlight significant technology trends, emerging technologies and associated prospective developments. This meeting provides a forum for all aspects of optics fabrication and testing, ranging from micro to large-scale optics and from high value one-off to mass-produced components.

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2nd EOS Conference on Optofluidics (EOSOF 2013)

Location: 
International Congress Centre Munich (ICM), Germany
Duration: 
13 May 2013 - 15 May 2013
Submission Timeframe: 
9 January 2013 - 23 January 2013

Picture © Messe München GmbHEOSOF 2013 is held under the umbrella of the WORLD OF PHOTONICS CONGRESS 2013, the leading international congress for optical technologies in Europe (12 - 16 May 2013). (Photo © Messe München GmbH)

Advance programme
Pre-registration is closed, please register on-site at the EOS counter in the entrance hall.

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