TOM 3 – Optical System Design and Tolerancing

Berlin Adlershof, Germany
Part of: 
EOSAM 2014
15 September 2014 - 19 September 2014
Submission Timeframe: 
28 February 2014 - 4 April 2014

Future trends in Optical Design with regard to Technology and Application


Topics include but are not limited to:

  • Optical & optomechanical system design
  • Tolerances
  • Error budgeting
  • Technological and manufacturing aspects
  • Alignment strategies
  • Digital correction means
  • Cost considerations
  • Standardization
  • Including both imaging and non-imaging optics (with applications in lighting)


  • Chair: Wilhelm Ulrich, Carl Zeiss AG (DE)
  • Co-chair: Kimio Tatsuno, Koga Research Institute Inc., Tokyo (JP)


  • Andrew Wood, Qioptiq (UK)
  • Irina Livshits, NRU-ITMO, University of St. Petersburg (RU)
  • Julius Muschaweck, ARRI (DE)
  • Jyrki Kimmel, Nokia (FI)
  • Kimio Tatsuno, Koga Research Institute Inc., Tokyo (JP)
  • Rob Bates, Five Focal LLC (US)
  • Ruben Mohedano, LPI (ES)
  • Rung-Ywan Tsai, Industrial Technology Research Institute, Hsinchu (TW)
  • Stefan Bäumer, TNO (NL)
  • Wilbert Ijzermann, Philips Lighting (NL)
  • Wilhelm Ulrich, Carl Zeiss AG (DE)
  • Wolfgang Vollrath, KLA-Tencor (DE)
  • Yasuhiro Ohmura, Nikon (JP)
  • Yongtian Wang, Beijing Institute of Technology (CN)


  • David Shafer, Shaferlens (US): The Evolution of a New High NA Broad Spectrum Catadioptric Design


  • Alexander Epple, Carl Zeiss SMT AG (DE): Optics design with free form surfaces
  • Alois Herkommer, Universität Stuttgart (DE): The Larange Invariant- a bridge between imaging and illumination design
  • Andy Harvey, University of Glasgow (GB): Broadening the design focus with computational imaging
  • Anurag Gupta, Google (US)
  • Chir Weei Chang, Industrial Technology Research Institute, Hsinchu (TW): Optical design and tolerancing of plenoptical camera
  • David Aikens, Savvy Optics (US): Overview about standardization in optics 
  • Dewen Cheng & Yongtian Wang, Beijing Institute of Technology (CN): Optical design and evaluation of large-magnification and high-definition rigid endoscope
  • Jan ten Thije Boonkkamp, Technical University of Eindhoven (NL): Monge-Ampere equation in illumination optics
  • Jannick Rolland, University of Rochester (US): Design of a Manufacturable Freeform Three-Mirror Imaging Telescope
  • John Rogers, Synopsys (US) 
  • Keishi Kubo, Panasonic Corp. (JP): Metrology for Asphere and Freeform optics by UA3P
  • Kevin Thompson, Synopsys (US)
  • Koichi Takahashi,  Olympus Corp. Tokyo (JP): Optical Design for the wearable head mount display
  • Massimiliano Pindo, TPI, Dresden (DE): Photomask challenges of EUV technology
  • Oliver Dross, Philips Lighting (NL): Köhler integration in color mixing collimators
  • Peter Brick, Osram (DE): Progress in High-luminance LEDs to benefit Etendue-critical Systems
  • Stephan Berlitz, Audi AG (DE): Optics for car lighting application
  • Takashi Inoue, Hamamatsu Photonics K.K. (JP): Wavefront control technology using spatial light modulator in bio and medical imaging
  • Thomas Nobis, Carl Zeiss AG (DE): A surface-resolved approach for analysis and correction of secondary color 
  • Toyohiko Yatagai, Utsunomiya University of Tokyo (JP): Optical mass storage based on polarization holography
  • Willem Vos, University of Twente (NL): Scattering of light in LED’s
  • Wolfgang Vollrath, KLA-Tencor (DE): Optical Design and Manufacturing Requirements for High- Performance Microscope Objectives
  • Zenta Ushiyama, Tyco Corp. (JP): Optical design for illumination systems