Delft, Netherlands
8 October 2018


Tutorials will be held on Topical Meeting topics on Monday, 8 October, 2018, prior to the conference program (conference starts 9 October, 2018). The tutorials are targeted for students new to the field but also others are welcome to attend. Participation of these tutorials is free for all registered participants of the conference. Registration is mandatory. Registration opesn in May 2018.
See also Autumn Physics School for Metrology.


  Sensing applications enabled by silicon photonics (TOM1)
  Roel Baets, Ghent University (Belgium)

  Optical and material-driven resolution enhancementsfor semiconductor litography (TOM 3) 
  Andreas Erdmann
  Fraunhofer Institute for Integrated Systems and Device Technology IISB

Andreas Erdmann is head of the Fraunhofer IISB lithography and optics group and teaches as “Privatdozent” at the University of Erlangen. Dr. Erdmann is also mentor of the Erlangen school of advanced optical technologies (SAOT), which is one of the Excellence Initiatives of the German Research Foundation (DFG). Dr Erdmann’s fields of research include simulation of optical lithography, computational imaging, computational electrodynamics, microelectronic process technology, and modern optics. He is a renowned expert in optical and EUV lithography with almost 20 years of experience and more than 170 scientific publications in this field. He chaired SPIE conferences on “Optical Microlithography” and “Optical Design” and is organizer of the International Fraunhofer Lithography Simulation Workshop. He contributed to the development of several advanced lithography simulators including the Development and research LiTHOgraphy simulator Dr.LiTHO. Dr. Erdmann is Fellow of the SPIE.

  Optimization in Optics Fabrication (TOM 3)
  Oliver Fähnle , Fisba, Switzerland

   Aspheres fab and design (TOM 3)
   Ulrike Fuchs, asphericon GmbH, Germany

Aspheres are becoming more popular in optical design of optical systems. This trend is caused by the demand for reducing size and weight or even novel optical performance, which cannot be obtained with spherical designs only. This demand lead to innovative manufacturing processes for serial production of aspheric surfaces of high quality. Unfortunately, due to the type of surface form deviation introduced by CNC based grinding and polishing processes, tolerancing an optical system with aspherical surfaces becomes very complex. Especially for serial production it is critical to know just how “good” an asphere has to be in order to guarantee the optical performance needed without overdoing it. Later one is a delicate issue to cost. This course will discuss how aspheres can be employed in optical design thoughtfully and how tolerances have to be dealt with. Special attention will be paid to surface form deviation and slope errors, which are unique to aspherical surfaces.
Curriculum vitae
Ulrike Fuchs studied physics at the Friedrich-Schiller University Jena from 1999 to 2004, majoring in optics. She started her academic career in 2003 working on numerical simulations for ultrashort pulse propagation in complex optical system. Subsequently, she pursued her PhD at Fraunhofer IOF and received her doctorate in 2009. Postdoctoral, she worked as research associate at the IOF Micro-Optical Department and as assistant lecturer at the Abbe School of Photonics. Joining asphericon in 2010 as an optical designer shifted her research focus to interlinking manufacturing of aspherics and metrology with questions in optical design. In 2012 she became Head of the Applications Department. She is continuously working on concepts that allow a prediction of system performance during optical design and tolerancing processes. Recently, great emphasis is put on transferring those ideas to freeform optics. Her current position oversees all R&D activities as well as strategic product development.

  Guglielmo Lanzani,
  Italian Institute of Technology, Milano, Italy (TOM 7)

  Philippe Lalanne,
  Institut d’optique, Bordeaux, France (TOM 5)