TOM 3- Optical System Design, Tolerancing, and Manufacturing

Location: 
Delft, Netherlands
Duration: 
8 October 2018 - 12 October 2018

Chairs

Oliver Fähnle,
FISBA AG (Switzerland)
Wilhelm Ulrich,
Carl Zeiss AG (Germany)

Sven Schröder,  Fraunhofer IOF Jena
(Germany)







 

Synopsis

TOM3 will highlight significant technology trends, emerging technologies and associated prospective developments in the field of optics design, tolerancing and fabrication. This conference provides a forum for all aspects of optics design and fabrication, ranging from micro to large-scale optics and from high value one-off to mass-produced components including lessons learned papers on special design and manufacturing issues. One main goal of the meeting is to provide a better link between the design, the manufacturing, and the characterization of optical components and systems. Consequently, special attention will be paid to the collaboration between design and fabrication to generate cost-effective and manufacturable optical systems.

 
Topics include

  • Optical and optomechanical system design and tolerancing
  • Optics Fabrication, from single piece to High-Volume Fab, sub-millimeter to meter optics, wafer-level optics
  • Upcoming technologies enabling innovative optical designs for new applications
  • Challenges of cost-effective manufacturability and testing methods based on a smart tolerancing process and well-adapted alignment strategies.
  • Testing, Specification, and Characterization of Light Scattering
  • Roughness, Shape, Defects, subsurface damage, MTF and mid-spatials
  • Finishing methods, e.g. SPDT, MRF, IBF, ductile grinding, FJP, laser polishing, CCP and traditional polishing
  • Optimization techniques in optics fabrication
  • Fabrication friendly Optical Design and Tolerancing
  • Lessons learned producing high level aspheres and freeform optics
  • Education in optics design and fabrication

 

Program Committee

  • Kimio Tatsuno, Koga Research Institute Inc, Japan
  • Stefan Bäumer, TNO, The Netherlands
  • Jyrki Kimmel, Nokia, Finland
  • Julius Muschaweck, ARRI, Germany
  • Yasuhiro Ohmura, Nikon, Japan
  • Andrew Wood, Qioptiq, United Kingdom
  • Irina Livshits, NRU-ITMO, University of St. Petersburg, Russia
  • Alois Herkommer, Uni Stuttgart, Germany
  • Marco Hanft, ZEISS, Germany
  • Kristina Uhlendorf, JABIL, Germany
  • Yongtian Wang, The Beijing Institute of Technology, China
  • Marcus Trost, Fraunhofer, Germany
  • Rolf Rascher, THD-  Technische Hochschule Deggendorf, Germany
  • Frank Frost, Ionenstrahlgestützte Technologien, Leibniz-Institut für Oberflächenmodifizierung e.V., Germany
  • Richard Freeman, Zeeko Ltd, United Kingdom
  • David Walker, University of Huddersfield, United Kingdom
  • Olaf Dambon, Fraunhofer Institut für Produktionstechnologie IPT, Germany
  • Jiri Novak, Czech Technical University in Prague, Czech Republic
  • Andreas Ettemeyer, NTB, Buchs, Switzerland
  • Sven Kiontke, Asphericon, Germany
  • Dae Wook Kim, Uni Arizona, United States
  • Massimiliano Rossi, Media-Lario, Italy
  • Roland Geyl, SAFRAN REOSC, France
  • Zhang Xuejun, Changun Institute of Optics, Fine Mechanics and Physics, China
  • Thomas Arnold, Uni Leipzig, Germany
  • Jessica DeGroote Nelson, Optimax Systems Inc., United States

 

  Invited Speakers

  • Herbert Gross, FSU Jena, Germany; Higher order spherical aberration revisited
  • Julie Bently, University of Rochester, USA; Optical designs incorporating freeform gradient index (GRIN) distributions: from simple objectives and eyepieces to complex virtual reality devices
  • DaeWook Kim, University of Arizona, USA; Process control fabricating giant optics
  • David Walker, University of Huddersfield, United Kingdom; Fully automating fine optics manufacture - why so tough and what are we doing
  • Christian Vogt, THD Deggendorf, Germany; Standardised evaluation of grinding tools for brittle mode grinding
  • Sven Kiontke, Asphericon, Germany; Industrial fabrication of aspheres:challenges and myths
  • Sven Schröder,  Marcus Trost, Tobias Herffurth, Fraunhofer IOF, Germany; Light scattering: From academic research towards industrial applications
  • Bob Kzuizinga, TNO Kruizinga, Netherlands; Freeforms: the enabling technology for compact spectrometers
  • Jürgen Bode, Satisloh GmbH, Germany; Next generation optics cnc machining
  • Olaf Dambon, Fraunhofer IPT Aachen, Germany; Wafer Level Manufacturing - an Approach for the High-Volume Fabrication of  Glass Optics for Imaging Applications
  • John Tamkin, Imaging Insights LLC, USA; The effect of machine tool signatures on optical performance, and comparison of methods for specification  
  • Niels Heidler, Fraunhofer Institute for Applied Optics and Precision Engineering, Germany; Additive manufacturing of lightweight metal mirrors for telescopes
  • Takeshi Shimano, Hitachi Ltd., Japan; Lensless Light-Field Imaging with Fresnel Zone Aperture
  • Sergey Bezdidko , Research Center, Krasnogorskyi Zavod, RU; Synthesis of optical systems based on Analytical methods and heuristic criteria
  • Andrea Berner, Zeiss, Germany;  A new 3rd -order spherochromatism surface contribution formula and its intrinsic and induced aberration parts
  • Mikko Juhola, Huawei, Finland; Special Features on Developing Miniaturized Imaging Optics for Smartphones
  • Yongtian Wang, The Beijing Institute of Technology, China; Applications of point-by-point design method in freeform imaging systems
  • Stephan Reichelt, Berliner Glas, Germany; Product development of optical systems – Prospects and challenges within the industrial B2B environment
  • Thomas Arnold, Leibniz Institute of Surface Engineering, Germany; Recent advances in plasma jet and ion beam based precision optics manufacturing
  • Zhang Xuejun, Changchun Institute of Optics, Fine Mechanics and Physics, China; Large SIC mirrors
  • Roland Geyl, SAFRAN REOSC, France; The various aspects of ELT critical optics manufacturing & testing
  • Okiharu Kirino, Crystal Optics, Japan  
  • Jonathan Papa, University of Rochester, USA; Starting point designs for freeform reflective imaging systems
  • Andreas Erdmann, Fraunhofer IISB, Germany; Mask and illumination induced imaging effects in EUV lithography

 

INDUSTRIAL POSTER SESSIONS

Already held within the World of Photonics Congress in 2017, the platform is again available at EOSAM 2018. We provide this platform for companies to enable extra visibility and chance to present their know how to the conference attendees.

In this reviewed industrial poster session companies are entitled to present their key technology competences on a poster that will be presented during the whole time of the conference in the conference session room. Posters presenting competences and know how rather than products will be preferred.

Submit your poster for review here: https://www.conftool.com/eosam2018
Select "poster presentation" and remark that the poster is for the industrial poster session (add a note in the "").

Companies are asked to deliver the poster onsite (either personally or by postal mail). The fee for posters is 100 EUR (excl. VAT 24%). Companies with VAT number will be exempted of VAT (VAT number needs to be indicated in the payment phase).

For more information, contact eosam@myeos.org