TOM 6 - Frontiers in Optical Metrology

Location: 
Delft, Netherlands
Duration: 
8 October 2018 - 12 October 2018

Chairs

   

Bernd Bodermann,
Physikalisch Technische Bundesanstalt (Germany)
 
Ralf Bergmann,
BIAS - Bremer Institut für Angewandte Strahltechnik GmbH (Germany)

 



Synopsis

This Topical Meeting is designed as a forum for application-oriented basic and applied optical metrology techniques. This includes basic methods, fundamental limits, measurement techniques and their applications, foundations of applied metrology as well as future trends and topics. As optical metrology methods are generally non-contact, non-destructive, fast, reliable, have a high precision and can sometimes even be used in a rugged environment, they lend themselves very much to industrial applications such as process development, in line processing (roll-to-roll, in process etc.), and quality control.

However, since industrial demands are sometimes very specific and of course ever increasing, there is a continuous requirement for more ruggedness, higher resolution, faster measurement and evaluation to name only a few constraints. This situation not only calls for evolutionary improvement, but also asks for new ideas or even revolutionary breakthroughs. Besides developing new methods and paradigms, also rigorous modelling and simulations deserve due attention, especially in the emerging fields of hybrid and holistic metrology. Finally, an assessment on the absolute performance in terms of resolution and measurement uncertainty stresses the role of traceability to internationally recognized primary metrology standards. These, in turn, translate into calibration efforts to obtain metrically valid and consistent results.

EOSAM is an excellent opportunity not only to focus on the frontiers of optical metrology, but also to interact with many international experts on neighboring topics, such as Optical System Design, Biophotonics, Metamaterials or Diffractive Optics. We are looking forward to meeting you in Delft!
 

Topics include (but are not limited to)

  • Interferometric form measurement techniques (Digital Holography, Shearing Interferometry, White-Light Interferometry etc.)
  • Non-interferometric form measurement techniques (Geometrical optics e.g. Fringe Projection, Structured Light, Deflectometry)
  • High precision metrology of large objects (3D imaging, 3D shape)
  • Microscopy (2D and 3D-imaging, high-NA systems, Optical Tomography, Quantitative Phase Imaging, non-interferometric phase sensitive microscopy, phase retrieval, high speed microscopy, microscopy in flows, …)
  • Resolution- and sensitivity-enhancement techniques (superlensing, magneto-optics, plasmonics, field engineering, quantum-enhanced measurements)
  • Computational photonics for metrology and rigorous electromagnetic simulations (e.g. Computational Shear Interferometry, image processing, scattering and diffraction problems)
  • Non-imaging techniques (optical scatterometry, ellipsometry, Mueller-polarimetry) e.g. for nanometrology and surface and thin layer characterisation 
  • Non-destructive testing with optical methods (Inspection, monitoring, displacement, deformation, defect detection, aberration measurement)
  • Measurement uncertainty, calibration and standards (Primary and transfer standards down to nano-metrology, uncertainty budgeting)
  • In-process measurement (3D- and 4D-Metrology, high speed techniques, defect detection)