TOM 6 - Frontiers in Optical Metrology

Location: 
Delft, Netherlands
Duration: 
8 October 2018 - 12 October 2018

Chairs

   

Bernd Bodermann,
Physikalisch Technische Bundesanstalt (Germany)
 
Ralf Bergmann,
BIAS - Bremer Institut für Angewandte Strahltechnik GmbH (Germany)

 



Synopsis

This Topical Meeting is designed as a forum for application-oriented basic and applied optical metrology techniques. This includes basic methods, fundamental limits, measurement techniques and their applications, foundations of applied metrology as well as future trends and topics. As optical metrology methods are generally non-contact, non-destructive, fast, reliable, have a high precision and can sometimes even be used in a rugged environment, they lend themselves very much to industrial applications such as process development, in line processing (roll-to-roll, in process etc.), and quality control.

However, since industrial demands are sometimes very specific and of course ever increasing, there is a continuous requirement for more ruggedness, higher resolution, faster measurement and evaluation to name only a few constraints. This situation not only calls for evolutionary improvement, but also asks for new ideas or even revolutionary breakthroughs. Besides developing new methods and paradigms, also rigorous modelling and simulations deserve due attention, especially in the emerging fields of hybrid and holistic metrology. Finally, an assessment on the absolute performance in terms of resolution and measurement uncertainty stresses the role of traceability to internationally recognized primary metrology standards. These, in turn, translate into calibration efforts to obtain metrically valid and consistent results.

EOSAM is an excellent opportunity not only to focus on the frontiers of optical metrology, but also to interact with many international experts on neighboring topics, such as Optical System Design, Biophotonics, Metamaterials or Diffractive Optics. We are looking forward to meeting you in Delft!
 

Keynote Speaker

Application of Mueller Matrix Spectroscopic Ellipsometry to  Scatterometry based Measurement of Feature Shape and Dimension
Alain Diebold, SUNY Polytechnic Institute, Albany, United States of America
 

Invited Speakers

  • Pietro Ferraro, Inst. of. Applied Science, Italy; Coherent Imaging Microscopy at Lab on chip scale for biomedical applications
  • Margozata Kujawinska, WUT, Poland; Opto-numerical and multimodal approach to full-field 3D shape and displacement measurements
  • Björn Kemper, Medical Faculty University of Muenster, Germany; Advances in label-free quantitative phase imaging of living cells and biological tissues with digital holographic microscopy
  • Nabeel Riza, University College Cork, Ireland; CAOS camera technology - Empowering laser metrology
  • Demetri Psaltis, EPFL Lausanne, Switzerland; Learning approach to optical imaging
  • Stefan Danilishin, Max Planck Institute for Gravitational Physics (Albert Einstein Institute), Germany; The hunting of the Chirp: a practical guide to "hearing" the echoes of distant collisions of black holes and neutron stars using light
  • Bodil Holst, University of Bergen, Norway; Neutral Helium Microscopy - A gentle way to see with matter

 

Topics include (but are not limited to)

  • Interferometric form measurement techniques (Digital Holography, Shearing Interferometry, White-Light Interferometry etc.)
  • Non-interferometric form measurement techniques (Geometrical optics e.g. Fringe Projection, Structured Light, Deflectometry)
  • High precision metrology of large objects (3D imaging, 3D shape)
  • Microscopy (2D and 3D-imaging, high-NA systems, Optical Tomography, Quantitative Phase Imaging, non-interferometric phase sensitive microscopy, phase retrieval, high speed microscopy, microscopy in flows, …)
  • Resolution- and sensitivity-enhancement techniques (superlensing, magneto-optics, plasmonics, field engineering, quantum-enhanced measurements)
  • Computational photonics for metrology and rigorous electromagnetic simulations (e.g. Computational Shear Interferometry, image processing, scattering and diffraction problems)
  • Non-imaging techniques (optical scatterometry, ellipsometry, Mueller-polarimetry) e.g. for nanometrology and surface and thin layer characterisation 
  • Non-destructive testing with optical methods (Inspection, monitoring, displacement, deformation, defect detection, aberration measurement)
  • Measurement uncertainty, calibration and standards (Primary and transfer standards down to nano-metrology, uncertainty budgeting)
  • In-process measurement (3D- and 4D-Metrology, high speed techniques, defect detection)


Program Committee

  • Jürgen Czarske, TU Dresden, Germany
  • Peter Lehmann, Univ. Kassel, Germany
  • Rainer Tutsch, TU Braunschweig, Germany
  • Martin Foldyna, Ecole Polytechnique, LPICM, France
  • Richard Leach, Univ. Nothingham; formerly NPL, Great Britain
  • Herbert Gross, IAP FSU Jena, Germany
  • Poul-Erik Hansen, DFM, Denmark
  • Omar El Gawhary, VSL, Netherlands
  • Frank Höller, ZEISS, Germany
  • Marco Pisani, INRIM, Italy
  • Silvania Pereira, TU Delft, Netherlands