4th EOS Topical Meeting on Advanced Imaging Techniques

10th June 2009 - 12th June 2009
Ernst-Abbe-Zentrum, Jena, Germany

This meeting is the 4th of the EOS Topical Meeting Series on Advanced Imaging Techniques. Former meetings took place in Delft (2003), London (2005) and Lille (2007).

Deadline for abstract submissions: 28 February 2009

Download the call-for-papers (pdf-file; 698 kb) 

Synopsis
Topics
Deadlines & Abstract Submission
JEOS:RP Special Publication Offer
Springer Award for Students
Invited Speakers
Chairs & Organizing Committee
Programme Committee
Venue
Travel & Accomodation
Contact

Synopsis

Optical imaging techniques have long history of both fundamental research and practical applications. Nowadays, an extraordinary development of digital photo and video cameras, DVD players, the last generation of cellular telephones, makes the optical imaging technologies accessible not only for the scientific community but also for general population. The complexity and sophistication of imaging techniques is constantly increasing. We are witnessing a permanent search for increasing “dimensionality” of imaging, growth of its information content, enhancement of resolution and sensitivity, and so on. New techniques such as imaging with metamaterials, quantum imaging, imaging of nanostructures, and others have appeared in the last few years, enabling new applications in technology and biology. The whole area of optical imaging techniques in spite of its very long history is currently experiences a burst of activity in its numerous branches.

The focus of the Topical Meeting is on the spectrum of novel techniques that are introduced to meet the drastically extended requirements in optical imaging. The meeting will be traditionally organized in a manner to allow intensive discussions and a fruitful exchange of ideas with a single session of presentations and a poster sessions. Specialised in scope and restricted in number of participants the topical meeting organised in the heartland of Germany’s optics industry will give you the opportunity to easily establish contacts and to initiate new business relations and research collaborations.
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Topics

  • Astronomical imaging
  • Bioimaging
  • Imaging with Metamaterials
  • Nano imaging
  • Near field imaging
  • New applications of microscopy
  • Optical Design
  • Optical Lithography
  • Partial coherence
  • Polarised imaging
  • Quantum +optical imaging
  • Rigorous simulation
  • Structured illumination
  • Wave optics

Deadlines

Deadline for abstract submissions: 28 February 2009
Publication of the advance programme: 10 April 2009
Post-deadline submissions deadline: 26 May 2009
Publication of the final programme: 3 June 2009

Abstract Submission

Authors are requested to submit an extended abstract ofa maximum of two pages with at least one figure. The EOS guidelines for abstracts can be downloaded at http://www.myeos.org/files/abstractguidelines.pdf.

Contributions will be accepted for oral and poster presentation. Please indicate preference. All accepted contributions are to be published in the printed EOS Topical Meeting Digest which will be available at the beginning of the meeting. All authors are requested to register for the meeting separately from abstract submission.

The abstract submission will be open from 12 January 2009. Abstracts can only be submitted online via this website. If you would like to be alerted when the submission is opened, please send an email to jena@myeos.org.
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JEOS:RP - Special Publication Offer

Attendees of this EOS Event receive a 20% discount on the publication rate for the Journal of the European Optical Society - Rapid Publications (JEOS:RP). The paper submitted must be an original contribution that is connected to this topical meeting and must be submitted no later than 31 August 2009 (-> www.jeos.org).
Publication rates:
320 € (instead of 400 €) for non-members
280 € (instead of 350 €) for full EOS members

Springer Award for Students

The best student posters and oral presentations will be awarded a prize that is sponsored by Springer.
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Confirmed Invited Speakers

Bernd Bodermann (PTB, DE)
Russel Chipman (University of Arizona, US)
Harald Giessen (University of Stuttgart, DE)
Rainer Hillenbrand (Max Planck Institute of Biochemistry, DE)
Stefan Linden (University of Karlsruhe, DE)
Adolf Lohmann (University of Erlangen-Nuremberg, DE)
Eric Potma (University of California, US)
Dimitri Psaltis (EPFL, CH)
Daniel Rouan (LESIA Observatoire de Paris)
Bahaa Saleh (Boston University, US)
Vahid Sandoghdar (ETH Zurich, CH)
David Shafer (David Shafer Optical Design, US)
Hari Shroff (Howard Hughes Medical Institute, US)
Jari Turunen (University of Joensuu, FI)

Chairs & Organising Committee

Herbert Gross (Carl Zeiss AG, DE)
Peter Török (Imperial College London, GB)
Michael Totzeck (Carl Zeiss AG, DE)
Andreas Tünnermann (Fraunhofer IOF, DE)
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Programme Committee

Pierre Chavel (Institut d'Optique, FR)
Jacob Stamnes (University of Bergen, NO)
Mike Somekh (Université de Bordeaux I, FR)
Mario Bertolotti (Università di Roma La Sapienza, IT)
Pedro Andres (Universidad de Valencia, ES)
Joseph Braat (TU Delft, NL)
Claude Fabre (Laboratoire Kastler Brossel, FR)
Hans Peter Herzig (Université de Neuchâtel, CH)
Bernard Hoenders (University of Groningen, NL)
Michael Kolobov (Université de Lille, FR)
Philippe Refregier (Institut Fresnel, FR)
Ari Friberg (KTH, SE)
Herbert Gross (Carl Zeiss AG, DE)
Michael Kempe (Carl Zeiss AG, DE)
Peter Török (Imperial College London, GB)
Michael Totzeck (Carl Zeiss AG, DE)
Andreas Tünnermann (Fraunhofer IOF, DE)
Ralf Wolleschensky (Carl Zeiss AG, DE)

Venue

The Abbe-Zentrum Beutenberg (Hans-Knoell-Straße 1, 0774 Jena, Germany) is the heart of the Beutenberg Science Campus in Jena. In the second half of the nineteenth century, Jena developed into an industrial city thanks to the work of the three scientific and economic giants Carl Zeiss, Otto Schott and Ernst Abbe. Their cooperation led to the creation of the world-famous Zeiss works and the Jena "Schott und Genossen" glassworks. This effective cooperation between research institutes and economic enterprises has proved its value all the way up to the present day and justifies Jena's exceptional reputation as a high-technology location.
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Travel and accomodation

How to get to Jena:
For attendees coming from abroad by air the easiest way to get to Jena is to fly to Berlin or Leipzig and then to take an ICE train to Jena. For more information, please see http://www.jena.de/sixcms/detail.php?id=12325&_nav_id1=12663&_nav_id2=12736&_lang=en or contact the Jena Tourist Information at tourist-info@jena.de.

Recommended hotels and directions to the meeting location:
Please download the hotel list and directions for a list of recommended hotels and directions how to get to the meeting location. 

 

Contact

EOS Office
Silke Kramprich (Event & Account Management)
Tel.: +49-511-2788-117
Email: jena@myeos.org